Function:
The mask aligner is used for photolithography work.
Specifications:
The wafer chuck can accommodate samples ranging in size from a few
millimeters to two inches (5.08 cm). The system can deliver accuracy
up to 1 um. The alignment module is capable of handling proximity,
soft contact and hard contact (vacuum) printing requirements.
This mask aligner was manufactured by Hybrid Technology Group, Inc.
Contact:
Dr. Renganathan Ashokan,