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Research Facility
Device Fabrication Lab



The MPL has excellent capabilities and noteworthy experience for the fabrication of microdevices. Our mask aligner provides nearly 1um tolerance of image transfer on the semiconductor surface. For the evaporation of metals and insulators, both electron beam and sputtering systems are available.

The MPL is currently engaged in the fabrication of MCT-based infrared detector arrays. Our interests include the fabrication of test structures to study in detail the various limiting current mechanisms involved in the device, p on n medium wavelength infrared (MWIR), long wavelength infrared (LWIR) staring detector arrays, arrays for high temperature (> 120 K) operation, and arrays for multi-color detection. Currently, the facilities at the Microfabrication Applications Laboratory (MAL), at the Department of Electrical Engineering and Computer Science, is being used for the fabrication of devices. This is because the clean room and fabrication facilities of the MPL are currently being renovated. The device fabrication and characterization facilities at the MPL include:

  1. Mask Aligner
  2. Photoresist Spinner
  3. Evaporation Systems
    1. Sputtering System
    2. Electron Beam Evaporation Unit
  4. Bonder
  5. I-V, C-V Setup
  6. Spectral Response Measurement System


Contact: Dr. Renganathan Ashokan,
ashokan@uic.edu.


Facilities

Laboratory Equipment List:


Materials Growth

 Opus 45 MBE system
 MBE Cluster Tool system
 Riber-32 MBE system
 Riber-EPI MBE system

Materials Characterization

 Scanning Electron Microscope
 Hall measurement system
 Ellipsometry System
 The Auger System
 Vacuum Electro-Reflectance
 Photoluminescence
 Other Equipments

Device

 Device Fabrication
 Mask Aligner
 Photoresist Spinner
 Evaporation Systems
 Bonder
 I-V, C-V Setup
 Spectral Response

© 2000
Microphysics Laboratory
University of Illinois at Chicago