Fall 2006

Dec 2006  
20 - Prodyut Evaluation & Testing of Copper(II) Aminoalkoxide Precursor for Direct Metal Printing
        Howie Tran Current Food Group Projects
06 - Lixiao Progress Report
Nov 2006  
29 - Dr. Greg Jursich Thermal Characterization & Analysis of High-k Precursors
13 - Rajesh Controlling Interfacial Reactions Between HfO2 and Si using Diffusion Barrier Layer
09 - Rajesh ALD of High-k materials for Gate Dielectric Applications
08 - Peggy MOCVD Heterostructures of TiO2 & Al2O3 using cycling of TDEAT, TMA & O2
       Rajesh Process-structure Relationships of Aluminum-doped ALD HfO2 Thin Films
01 - Prof. Takoudis The Craft of Technical Presentation
Oct 2006  
26 - Amjad Low Voltage Organic Field Effect Transistor with High-κ Nanocomposite Gate Insulator
20 - Peggy Crystallization & Stability of MOCVD TiO2/Al2O3 films
06 - Prodyut Fundamental Studies on Copper Diffusion Barriers for Ultra-Large Scale Integration (ULSI)
Sep 2006  
27 - Deepthi Electrical Properties of Silicon Nanoparticles Deposited by Low Pressure Chemical Vapor Deposition
20 - Manish Information from the C-V measurements of Metal-Insulator-Semiconductor (MIS) capacitors made using high-k dielectrics
13 - Lin BIAcore - Detecting the interaction between proteins
   



 
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Last updated: May 01, 2007.