|
Dec 2006
|
|
| 20 - Prodyut |
Evaluation & Testing of Copper(II)
Aminoalkoxide Precursor for Direct Metal Printing |
|
Howie Tran |
Current Food Group Projects |
| 06 - Lixiao |
Progress Report |
|
Nov 2006
|
|
| 29 - Dr. Greg Jursich |
Thermal Characterization & Analysis
of High-k Precursors |
| 13 - Rajesh |
Controlling Interfacial Reactions
Between HfO2 and Si using Diffusion Barrier Layer |
| 09 - Rajesh |
ALD of High-k materials for Gate
Dielectric Applications |
| 08 - Peggy |
MOCVD Heterostructures of TiO2
& Al2O3 using cycling of TDEAT, TMA & O2 |
|
Rajesh |
Process-structure Relationships of
Aluminum-doped ALD HfO2 Thin Films |
| 01 - Prof. Takoudis |
The Craft of Technical Presentation |
|
Oct 2006
|
|
| 26 - Amjad |
Low Voltage Organic Field Effect
Transistor with High-κ Nanocomposite Gate Insulator |
| 20 - Peggy |
Crystallization & Stability of
MOCVD TiO2/Al2O3 films |
| 06 - Prodyut |
Fundamental Studies on Copper
Diffusion Barriers for Ultra-Large Scale Integration (ULSI) |
|
Sep 2006
|
|
| 27 - Deepthi |
Electrical Properties of Silicon
Nanoparticles Deposited by Low Pressure Chemical Vapor
Deposition |
| 20 - Manish |
Information from the C-V
measurements of Metal-Insulator-Semiconductor (MIS) capacitors
made using high-k dielectrics |
| 13 - Lin |
BIAcore - Detecting the interaction
between proteins |
|
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