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Year 2006

Year 2006


Fall 2006

Dec 2006  
20 - Prodyut Evaluation & Testing of Copper(II) Aminoalkoxide Precursor for Direct Metal Printing
        Howie Tran Current Food Group Projects
06 - Lixiao Progress Report
Nov 2006  
29 - Dr. Greg Jursich Thermal Characterization & Analysis of High-k Precursors
13 - Rajesh Controlling Interfacial Reactions Between HfO2 and Si using Diffusion Barrier Layer
09 - Rajesh ALD of High-k materials for Gate Dielectric Applications
08 - Peggy MOCVD Heterostructures of TiO2 & Al2O3 using cycling of TDEAT, TMA & O2
       Rajesh Process-structure Relationships of Aluminum-doped ALD HfO2 Thin Films
01 - Prof. Takoudis The Craft of Technical Presentation
Oct 2006  
26 - Amjad Low Voltage Organic Field Effect Transistor with High-κ Nanocomposite Gate Insulator
20 - Peggy Crystallization & Stability of MOCVD TiO2/Al2O3 films
06 - Prodyut Fundamental Studies on Copper Diffusion Barriers for Ultra-Large Scale Integration (ULSI)
Sep 2006  
27 - Deepthi Electrical Properties of Silicon Nanoparticles Deposited by Low Pressure Chemical Vapor Deposition
20 - Manish Information from the C-V measurements of Metal-Insulator-Semiconductor (MIS) capacitors made using high-k dielectrics
13 - Lin BIAcore - Detecting the interaction between proteins
   

Summer 2006

July 2006  
27 - REU & RET Fellows  
03 - RET Fellows  
Jun 2006  
28 - RET Fellows  
26 - REU Fellows  
21 - Lixiao Characterization of Plasmodium falciparum-infected Erthrocyte with Electron Microscopes & Optical Sensor
13 - REU Fellows  
08 - Meera Optimization of a Method for Estimating the Lead Concentration Curve of the X-Ray Fluorescence Instrument
May 2006  
31 - Pinar Fundamental Studies on Modification of Silicon Surfaces using APTES (3-aminopropyltriethoxysilane) for Neural Implant Applications
31 - Peggy Characteristics of MOCVD titanium-aluminum oxide
24 - Amjad Printed Organic Electronics with a High-k Nanocomposite Dielectric Gate Insulator
24 - Meera Optimization of a Method for Estimating the Lead Concentration Curve of the X-Ray Fluorescence Instrument
19 - Pinar Fundamental Studies on Modification of Silicon Surfaces using APTES (3-aminopropyltriethoxysilane) for Neural Implant Applications
15 - Rajesh Fundamental Studies on High-k Materials Deposited using Atomic Layer Deposition Technique
05 - Deepthi Synthesis & Electrical Characterization of Silicon Nanoparticles for Electronic Applications

Spring 2006

Apr 2006  
12 - Amjad Processed High Capacitance Nanocomposite Dielectric for Printed Electronics Applications
        Hon Characterization of thin aluminum oxide films deposited using Atomic Layer Chemical Vapor Deposition
10 - Lixiao Qualitative and Quantitative Analyses of Parasite-induced knobs by Atomic Force Microscopy
        Pinar Silicon electrode surface modification with biomolecules to enhance neurocompatibility
05 - Deepthi Fabrication of Si nanowires using atomic layer deposition
Mar 2006  
31 - Rajesh XPS studies of ALD Al2O3 as barrier layer between ALD HfO2 and silicon substrate
        Prodyut XPS study of Hydrogen treated Cu(DEAE)2 precursor at 200 °C
        Deepthi Silicon Nanowires
        Peggy ALCVD of TiAlO deposition
        Manish Electrical Characterization of High-k films
24 - Chiun-Teh Multiferroic Structures
15 - Pinar Silicon electrode surface modification with biomolecules to enhance neurocompatibility
08 - Hon Characterization of thin aluminum oxide films deposited using Atomic Layer Chemical Vapor Deposition
Feb 2006  
24 - Prof. Sid Ghosh MBE Growth of Multifunctional Ferrites on Oxide Substrates
10 - Meera The site-specific calibration curve methodology for estimating the concentration of lead in soil using a portable X-Ray Fluorescence (P-XRF) instrument
03 - Manish High-k dielectrics
01 - Amjad Processed High Capacitance Nanocomposite Dielectric for Printed Electronics Applications
Jan 2006  
30 - Pinar Silicon electrode surface modification with biomolecules to enhance neurocompatibility
25 - Prof. Randall Meyer A First-Principles Analysis of Ag Sintering Mechanisms Over Alumina
18 - Xuemei TiAlO and TiAlON - High-k dielectric
11 - Deepthi Modeling the formation of Silicon Dioxide at Silicon and High-k Oxide Interfaces
   



 
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Last updated: May 01, 2007.