|
Apr 2007
|
|
| 27 - Thyagarajan |
Unified Chemical Model for the
Oxidation of Silicon Using Ozone |
| 25 - Rajesh |
Interfacial & Structural Studies of
Atomic Layer Deposited High Dielectric Constant Materials on Si |
| 11 - John |
Theoretical calculation of low
electron energy-loss spectra of andalusite (Al2SiO5)
using WIEN2k |
| 09 - Prodyut |
Characterization of Atomic Layer
Deposited Ultrathin HfO2 Film as a Diffusion Barrier
in Cu Metallization |
| 04 - Amjad |
FT-IR Analysis of High Permittivity
Nanocomposites for Printed Electronics |
|
François |
Photonic Bandgap Crystals Opal &
Inverse Opal Design |
|
Mar 2007
|
|
| 28 - Amjad |
XPS Analysis of High Permittivity
Nanocomposites for Printed Electronics |
|
Peggy |
Deposition &
Characterization of High-dielectric constant Materials (Titanium-based
dielectric) |
| 12 - Rajesh |
Atomic Layer Deposition &
Characterization of High-dielectric Materials |
| 02 - Deepthi |
Modeling Oxygen Diffusion-reaction
in High-dielectric constant materials in Silicon |
|
Jan 2007
|
|
| 24 - John, Meredith |
Theoretical calculation of low
electron energy-loss spectra of t-HfO2 and andalusite (Al2SiO5)
using WIEN2k |
| 19 - Lin |
Organic Thin-Film Transistors -
Dielectric & Semiconductor Materials |
|
|
|