I am currently a visiting senior scientist with extensive industrial research experience in semiconductor material processing. I am currently pursuing research on new materials for deposition of high dielectric films needed for future semiconductor devices. During my stay here on campus, I enjoy teaching classes in the chemistry department.

My research at UIC centers on new material compositions needed to advance the minimization of semiconductor devices down to nanoscale regime. In particular, high dielectric films remain my primary focus as they need to fulfill critical roles in transistor gate oxide layer and capacitive memory devices. The films are typically variable oxide compositions such as hafnium, silicon, and aluminum oxides. The goal of the research is to identify new compositions of thin films suitable to deliver demanding electrical properties down to atomic dimension while maintaining chemical and morphological stability through the rigors of semiconductor fabrication. Such an endeavor requires state of the art spectroscopy and microscopy probing techniques such as XPS, STEM/EELS, GIXRD as well as a detailed understanding of the physio-chemical properties of organometallic precursors used for such studies. As a result, these studies become strongly interdisciplinary as they cross boundaries of classical chemical engineering, physics, and chemistry.